Abstract
Titanium carbide (TiC) thin films have been grown on Si (100) substrates using a pulsed neodymium: yttrium-aluminum-garnet (Nd:YAG) laser deposition method. X-ray diffraction (XRD) pattern of the TiC film shows that substrate temperature is one of the most important parameters in the fabrication of crystalline TiC film. Crystalline TiC films can be prepared at substrate temperatures above 500°C. Field emission scanning electron microscope (FE-SEM) indicates that the surface of the film is very smooth and pinhole-free.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
