Abstract
SrTiO 3 thin films (STO), were deposited on Si(100) covered by 2 nm of SiO 2, at different temperatures from 450 °C to 850 °C using liquid injection MOCVD, the bimetallic precursor being Sr 2Ti 2(OiPr) 8(tmhd) 4. The STO films were analysed by XRD, FTIR, SIMS and TEM. An amorphous layer was observed between STO and SiO 2/Si. The nature and thickness of the interlayer were determined, as well as the most favourable conditions for a good quality crystalline STO film, and a reduced interlayer.
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