Characterization of compact ICP ion source for focused ion beam applications

Abstract

A compact, high brightness 13.56MHz inductively coupled plasma ion source without any axial or radial multicusp magnetic fields is designed for the production of a focused ion beam. Argon ion current of density more than 30mA/cm2 at 4kV potential is extracted from this ion source and is characterized by measuring the ion energy spread and brightness. Ion energy spread is measured by a variable-focusing retarding field energy analyzer that minimizes the errors due to divergence of ion beam inside the analyzer. Brightness of the ion beam is determined from the emittance measured by a fully automated and locally developed electrostatic sweep scanner. By optimizing various ion source parameters such as RF power, gas pressure and Faraday shield, ion beams with energy spread of less than 5eV and brightness of 7100Am−2sr−1eV−1 have been produced. Here, we briefly report the details of the ion source, measurement and optimization of energy spread and brightness of the ion beam.