Abstract
We suggest a new method to characterize the acid diffusion phenomena for negative chemically amplified resist (CAR) using X-ray proximity lithography (XRL) in a straightforward manner. By measuring replicated critical dimensions of narrow isolated lines with various post exposure bake (PEB) times at certain PEB temperatures, we can calculate the diffusivity of CAR. This method is applied to the measurement of the diffusivity for TDUR - N908 CAR.
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