Abstract
A Mo/Si multilayer (ML) has been fabricated as a reflector in the soft X-ray spectral region by pulsed laser deposition (PLD), using the second harmonic of Nd/YAG pulsed laser (5 ns, 532 nm light). The ML structure was characterized by transmission electron microscopy (TEM), small-angle X-ray scattering (SAXS) and photoelectron spectroscopy for chemical analysis (ESCA). The near-normal incidence reflectivity in the spectral range of 14–17 nm was measured using a soft X-ray reflectometer based on a laser-produced plasma. The structural parameters were evaluated by fitting to both the SAXS profile and the soft X-ray reflectance measurement with asymmetric interface profile, roughness and composition taken into account.
Paper version not known (
Free)
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call