Abstract
Silicon incorporated diamond-like carbon films up to 6.2 at. % (DLC- Si ) were deposited onto a high speed steel samples by using a radio frequency plasma-enhanced chemical vapor deposition method. The influence of silicon doping on chemical composition, bonding structure, hardness, and adhesion of DLC films was investigated. Hexamethyldisilane ( HMDS ) gas was used as a silicon source with Ar carrier gas ranging from 0 to 15 sccm. Also, the mixtures of methane ( CH 4) and Ar gases were used as precursor gases. The addition of silicon into the DLC film was found to lead an increase of bonding ratio ( sp 3/ sp 2), hardness and critical adhesion
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