Abstract
(Zr47Cu44Al9)100−xSix (x = 0, 0.5, 1.5 and 2.5 at%) thin-film metallic glasses (TFMGs) were deposited at glass substrate by pulsed laser deposition. The influence of Si content and substrate temperature on the microstructure, optical and electrical properties was investigated. After adding Si in the Zr47Cu44Al9 system, the transmittance of the films enhances obviously, especially in the near-infrared region. The resistivity increases and becomes more sensitive to the temperature due to Si addition. With increasing substrate temperatures from room temperature to 430 °C, (Zr47Cu44Al9)98.5Si1.5 films display fully amorphous structure. Appropriate substrate temperature drastically decreases the resistivity of films without degrading the transmittance. (Zr47Cu44Al9)98.5Si1.5 TFMG deposited at 330 °C exhibits the visible transmittance of 49.38%, the infrared transmittance of 80.27% and the resistivity of 7.62 mΩ cm, which are useful properties for their potential applications in infrared technology with the high requirement of radiation resistance and corrosion resistance.
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