Abstract

ZnO thin films are grown on quartz substrates at various substrate temperatures (ranging from 573 to 973K) under an oxygen ambience of 0.02mbar by using pulsed laser ablation. Influence of substrate temperature on the structural, morphological, optical and electrical properties of the ZnO thin films are investigated. The XRD and micro-Raman spectra reveal the presence of hexagonal wurtzite structure of ZnO with preferred orientation (002). The particle size is calculated using Debye–Scherer equation and the average size of the crystallites are found to be in the range 17–29nm. The AFM study reveals that the surface morphology of the film depends strongly on the substrate temperature. UV–Visible transmittance spectra show highly transparent nature of the films in visible region. The calculated optical band gap energy is found to be decrease with increase in substrate temperatures. The complex dielectric constant, the loss factor and the distribution of the volume and surface energy loss of the ZnO thin films prepared at different substrate temperatures are calculated. All the films are found to be highly porous in nature. The PL spectra show very strong emission in the blue region for all the films. The dc electrical resistivity of the film decreases with increase in substrate temperature. The temperature dependent electrical measurements done on the film prepared at substrate temperature 573K reveals that the electric conduction is thermally activated and the activation energy is found to be 0.03911eV which is less than the reported values for ZnO films.

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