Chapter 3 - Exploring the Properties and Fuel Cell Applications of Ultrathin Atomic Layer Deposited Metal Oxide Films

Abstract

Atomic layer deposition (ALD) is a surface reaction limited method of depositing conformal, pinhole-free, and high-quality ultrathin films with uniform thickness onto planar or three-dimensional structures. Research on ALD is contributing to progress in the synthesis of high-efficient and low-cost ceramic nanomaterials for a sustainable future based on clean energy. In the search for sustainable energy materials, ultrathin ALD metal oxide films emerge as a promising class that combines functional properties and atomic precision that can be applied in energy conversion and storage systems. An outstanding application for these materials is as an electrolyte in fuel cells, because ceramic membranes produced by ALD exhibit improved surface exchange kinetics and reduced ohmic losses, consequently enhancing fuel cell performance at a low operating temperature. This chapter assesses the overall prospects of ultrathin metal oxide films on fuel cells based on requirements such as the material, efficiency, and development perspectives. It focuses on the key advantages that the use of ALD metal oxide films can offer to existing fuel cell technologies. A brief overview is presented on ultrathin metal oxide films for fuel cells outlining potential future opportunities based on three points: the ALD film process, material properties, and membranes for solid oxide fuel cell (SOFC) development. Because the work in this field is increasing rapidly, the main goal is to assist researchers and students to better understanding basic processes involved in the development of SOFC devices, which provide an attractive alternative to conventional thermal energy conversion by combusting fossil-derived fuels.