Abstract
Abstract Thermal scanning probe lithography is establishing itself as a versatile alternative to standard nano lithography techniques. As thermal scanning probe lithography does not use charged particles to define the pattern, delicate materials can be processed without damage. This is particularly relevant for novel 2D electronic materials such as graphene. Arbitrary-depth topographical (3D) patterns can be made without extra fabrication steps. The inbuilt topography imaging can be interleaved with the patterning mode to add a control loop to optimize the patterning parameters on the fly. This chapter outlines the steps required for the transfer steps from the written pattern into the substrate material. Depending on application, different approaches are required. These include the transfer of high-resolution 2D patterns, liftoff procedures for low- and high-resolution structures, 3D pattern transfer, master fabrication for imprint, and guided assembly of nanoparticles.
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