Abstract
The PZT films were deposited by the solgel method on platinized silicon substrates with different types of layer materials, such as silicon nitride and silicon oxide. The crystalline orientations of the PZT films were controlled by combined parameters of a chelating agent and pyrolysis temperature. A nanoindentation CSM (continuous stiffness measurement) technique was utilized to characterize the mechanical properties of these PZT films. It was observed that (001/100)-oriented films show higher Young's modulus compared with (111)-oriented films, indicating a clear dependence of film orientation. The influence of substrates on the mechanical properties of PZT thin films was also characterized. Finally, no significant influence of the film thickness was found on the mechanical properties of films thicker than 200 μm.
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