C-FEBID etching mask and C-FEBID in-situ removal; enabling a new micro- and nano fabrication route

Abstract

Herein we study theoretically and experimentally the role of the carbon element as an etching mask for ion beam exposure. We explore the removal of the C-FEBID remaining after the ion exposure applying an oxygen assisted electron beam irradiation process. Pattern transferred combining both processes, C-FEBID etching mask and C-FEBID removal, is a versatile route that avoids the presence of residual contaminants on patterned structures and it can be realized in a single tool without sample transfer or exposure to ambient air.