Abstract
The main intention of this paper is to understand clearly about the high performance of 4T-SRAM with an improved write margin. the power consumption is often reduced considerably by using a buried power rail (BPR) to the SRAM cell, which reduces the resistance of bit line and word line. The write margin is often increased by the fine standardization of metal dimensions within the SRAM cell. Conventionally, 4T-SRAM cell offers high speed and fewer space compared to 6T-SRAM cell. 4T-SRAM is actualized using 130nm CMOS Technology.
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