Abstract
1) Using conventional deposition techniques of heating or e-beam evaporation, the effect of the substrate’s temperature cannot be neglected. If the substrate temperature is not uniform, the uniformity of the film thickness and the film’s composition may change. But with magnetron sputtering deposition, the effect of the substrate temperature is almost absent. 2) It is known that various of evaporation depositions, such as ion sputtering deposition and other physical vapor depositions can hardly be used to prepare large-area uniform films. At present, magnetron sputtering deposition is the best preparation method of large-area uniform films. 3) With the quartz crystal monitor of film thickness and suitably designed film structures, films of less than 0.2% reflectivity in visible region can be obtained.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call