Abstract

Two kinds of diamond films with completely different morphologies were prepared on N-type heavily doped silicon wafers by microwave plasma chemical vapor deposition (MPCVD) method, namely, micron-scale large grain polycrystalline diamond film dominated by (220) crystal plane (220DF) and nano-scale small grain polycrystalline diamond film dominated by (111) crystal plane (111DF). And WS2 quantum dot powder was obtained by aqueous liquid phase ultrasonic method. Then, the 111DF/WS2 quantum dot composite structure film (111DWSF) and 220DF/WS2 quantum dot composite structure film (220DWSF) were prepared by applying WS2 quantum dot powder uniformly on diamond film substrate. The results of electroluminescence (EL) detection show that the 220DWSF device emits visible blue light, and the main peak of EL spectrum is located at 443 nm in the blue region. The 111DWSF device emits white light, and the corresponding EL spectra show strong emission peaks in the blue region (454 nm), green region (536 nm) and red region (632 nm) respectively, meanwhile, the luminous intensity of 111DWSF device is much higher than that of 220DWSF device. In addition, it is also found that the 220DWSF EL device does not show obvious rectification characteristics, while the 111DWSF EL device has obvious rectification characteristics. After FN fitting of the IV characteristic curve of 111DWSF EL device, the tunneling characteristics of electrons are found in the region of high electric field intensity.

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