Abstract
AbstractLow‐temperature processed bismuth niobate (BNO) thin films were explored in this work as a potential candidate for high‐energy density capacitors. The BNO samples were fabricated by the chemical solution deposition method followed by a series of ultraviolet (UV) exposure and heat treatments. A UV treatment prior to the final pyrolysis step was found to be useful in eliminating bound carbon. X‐ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) demonstrated that the residual carbon could be effectively removed at 350°C after UV exposure. Following a heat treatment at 450°C, the energy storage density of the BNO thin film reached 39 J/cm3 with an efficiency of 72%. Furthermore, 350°C and 375°C treated BNO samples showed high‐temperature stability such that the efficiencies of the films remained above 97% up to 150°C at 10 kHz under 1 MV/cm applied field.
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