Biplanar source for high rate, large area, reactive sputtering: SiO2

Abstract

A new type of sputtering source, called a ‘‘biplanar magnetron,’’ is described which permits well controlled, metallic (or ‘‘high rate’’)-mode deposition of SiO2 for large area industrial applications. Two biplanar magnetrons have been used to fabricate optical multilayer coatings on a 1-m-wide web. Clear films of SiO2 have been deposited with optical thickness uniformity equal to ±2% at a deposition rate of 3.6 Å/kW m/min. With one biplanar source operated at 20 kW, this rate corresponds to a line speed of 7.2 cm/min for a 1000-Å physical thickness of SiO2. The device is equally useful for many other compounds, including AlN, ZnO, Al2O3, ZrO2, and indium tin oxide.