Abstract
Bismuth Oxide (Bi 2O 3) rods are successfully prepared on δ-Bi 2O 3 films under atmospheric pressure by means of halide chemical vapour deposition using BiI 3 and O 2 as a starting material. The deposition of Bi 2O 3 rods strongly depends on the deposition temperature, the input partial pressure of BiI 3 and O 2 and the method for supplying O 2 gas. Bi 2O 3 rods can be obtained at [O 2]/[BiI 3] ratios of 500 and N 2:O 2=50:250. The length of the Bi 2O 3 rods increases proportionally from 2 to 30 μm, while their diameters of between 0.2 and 0.5 μm do not depend on the deposition time.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
