Abstract
AbstractFive‐membered difluoroboryl chelate complexes are competent substrates for radical reactions with various radical precursors including potassium trifluoroborates, bis(catecholato)siliconates, 4‐alkyl‐substituted Hantzsch esters, dihydroquinazolinones, esters of N‐hydroxyphthalimide, Katritzky salts, alkyl iodides and thiols. Using these reagents, primary, secondary, and tertiary radicals can be generated under oxidative or reductive conditions and add at the C=N bond of the difluoroboryl chelates leading to hydrazide products.
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