Abstract
For the fabrication of active matrix liquid crystal displays, indium tin oxide (ITO) patterns with beveled edges are highly desirable to ensure a good step coverage of subsequent layers. We obtained ITO patterns with slopes between 3 and 70°, by wet chemical etching ITO/Mo duplex films in solutions. The slope could be tailored by the HCl concentration, the concentration, and by the thickness of the Mo top layer.
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