Abstract
The fabrication of micron-scale backlighter targets is described. Traditionally laser targets have been fabricated using conventional machining or coarse etching processes and have been produced in quantities of 10s to low 100s. The processes described herein allow batch production with numbers in the 1000s. In addition, the Micro-Electro-Mechanical System (MEMS) fabrication techniques used allow much finer tolerances and more accurate placement of the various components relative to each other.
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