Abstract
A method is developed for the fabrication of sub-100 nm current-perpendicular spin-valve junctions with low contact resistance. The approach is to use a batch-fabricated trilayer template with the junction features defined by a metal stencil layer and an undercut in the insulator. The spin-valve thin film stack is deposited afterwards into the stencil, with the insulator undercut providing the necessary magnetic isolation. Using this approach, reproducible spin-current-induced magnetic switching is demonstrated for junctions down to 50 nm×100 nm in size.
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