Abstract
Background: Burn patients are at high risk for infection, and it has been estimated that 75% of all deaths following burns are related to infection. It is, therefore, essential for a burn institution to determine its specific pattern of burn wound microbial colonization, time-related changes in predominant flora and antimicrobial profiles. Aim: To find out the bacterial and fungal profile of burn wound and evaluate the antimicrobial susceptibility pattern of the organism isolated. Materials and Methods: The present study was conducted in the Department of Microbiology, Dr. V. M. Government Medical College, Solapur, Maharashtra from December 2012 to December 2014. The wound swabs were collected from 50 patients, having total body surface area of burn in between 20% and 40% on the 4 th , 10 th , and 16 th day. Total 202 wound swabs were collected aseptically and cultured for the growth of bacteria and the fungi. Bacterial growths were then subjected to various biochemical tests for identification and antibiotic sensitivity testing. Results: Single isolates were present in 71.28%, and multiple isolates were noted in 18.31% of wound swabs. The isolation rate of Gram-negative organisms was high. The most common isolate was Klebsiella pneumoniae (34.40%) followed by Pseudomonas aeruginosa (23.94%), Staphylococcus aureus (22.94%), Escherichia coli (7.34%), Acinetobacter spp. (2.75%), Proteus mirabilis (2.75%), and Citrobacter species (1.38%). Candida species (4.59%) was the only fungus isolated, of which Candida albicans (50%) was the most common. Gram-negative bacteria were the most sensitive to imipenem (93.67%) and amikacin (75.94%) while Gram-positive bacteria were the most sensitive to linezolid (100%) and vancomycin (100%). Conclusion: K. pneumoniae was found to be the most common bacterial agent involved. The results of the present study will be helpful in understanding the pattern of burn wound microbial infection, the dominant bacterial and fungal flora, and the antimicrobial resistance.
Published Version
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