Backing up Medium Current Implanters using Single Wafer High Energy Implanter for Manufacturing Efficiency

Abstract

Today most high volume manufacturing fabs are experiencing an inefficient distribution of resources between medium current (MC) and high energy (HE) implanters. The utilization levels of medium current implanters and high energy implanters differ greatly due to increasing amounts of medium current implant recipes. Medium current implanters are very highly utilized, while high energy implanters are not used as much. Thus, the high energy implant tools can be used to optimize manufacturing efficiency and production cost reduction by backing up the medium current tools. Traditionally, there were only well implants that can be processed on both single wafer medium current (SWMC) and batch HE implanters. However, by using the Varian VIISta 3000HP Single Wafer High Energy implanter (SWHE) with high tilt and true zero degree implantation capability, Vt, anti‐punch‐through and pocket/ halo implants can also be used as backups. The data of the electrical function and yield comparison between SWHE VIISta 3000HP and SWMC EHP500 was shown to be compatible. The throughput was also evaluated to match the productivity of medium current implanters which are higher than the batch tools. This paper shows that the SWHE can maximize the manufacturing efficiency and minimize the production cost.