Abstract
Atomically flat SrTiO3 (100) substrates have been obtained using annealing treatments at 1000° C in O2 flow. Ba0.3Sr0.7TiO3 (BSTO) films have been produced on these substrates using a pulsed laser deposition. Film thickness dependence on the dielectric constants of the BSTO films are examined in this study. The BSTO films produced on these atomically flat SrTiO3 substrates showed higher dielectric constants than those formed on the commercially supplied SrTiO3 substrates. It is considered that this phenomenon is caused by the stresses of the mismatch between the films and substrates. The interface flatness between the films and substrates is measured by transmission electron microscopy (TEM) which is desirable for the production of dielectric films.
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