Abstract
The Varian 160 XP high current ion implanter uses an automation system developed to conform to the requirements of today's fabrication facilities including automatic optimization of the ion beam, high process reliability, and minimum operator attendance. The Varian system provides automatic beam startup and shutdown, implant setup and scanning by computer control. The maximum performance of the machine can be achieved through the repeatable operation of the fully automated system employing process qualified recipes not susceptible to operator error. An automated implant sequence that allows multiple cassette runs without operator intervention is part of the new software system. Software systems that control beam characteristics and implant processes are described and supported with data showing typical implant uniformity results that can be achieved using these systems. Methods used to control the sequencing of the ion implant, venting, and wafer cycling for unassisted multiple cassette runs are presented to show the enhanced machine automation capabilities.
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