Abstract
The correlation of relative partial electron density at the oxygen ions with the intensity of Auger O KLL lines in Bi 2 O 3 , Al 2 O 3 , SiO 2 and UO 2 has been determined by Auger and X-ray photoelectron spectroscopic methods. The dependence of the relative intensities of Auger O KL 2–3 L 2–3 and O KL 1 L 2–3 -lines was characterized from the binding energy of O 1s electrons. The electron density of the outer valence levels of oxygen increases as the relative intensities of Auger O KL 2–3 L 2–3 and O KL 1 L 2–3 -lines increase. The fine structure observed in the O KL 1 L 2–3 Auger and the O 2s XPS spectra has been explained by the formation of inner valence molecular orbitals (IVMO) from the interaction of electrons of the O 2s and filled metal ns shells.
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