Abstract
Adsorption processes of Au on a high index Si(5512) surface were studied in situ by high resolution reflection electron microscopy with subunit cell resolution. Growth of new phases is quite anisotropic and rapid along the [11̄0] direction reflecting quite anisotropic substrate surface structure. At around 715°C, successive changes from (5512) to two-fold (337), (5511) and (225) facet were noted as an increase of Au deposit. (7717) surface units are locally formed before formation of the two-fold (337) surfaces. At higher temperature 780°C (above roughening temperature 750°C of (5511)-Au surface), a disordered surface is formed after formation of the two-fold (337) facet. The disordered surface is a higher temperature phase of the (5511) surface. Above changes are discussed in terms of characteristics of these high index surface structures.
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