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Abstract
Plasmachemical deposition using an atomized precursor spray can yield up to a 1000-fold enhancement in film deposition rate (microns/min). Furthermore, excellent functional and structural retention is achieved, which is in marked contrast to corresponding vapour-phase-plasma deposition for comparable input plasma powers. Poly(isodecyl acrylate) layers have been prepared by atomized spray plasma deposition (ASPD) using isodecyl acrylate precursor.
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