Abstract
The local atomistic structure in bulk Si x Ge1−x alloys in the whole composition range 0 < x < 1 was investigated experimentally and theoretically. By extended X-ray absorption fine structure measurements in Czochralski-grown bulk SiGe crystals it is found that bulk SiGe is a random mixture and that the Ge–Ge, Ge–Si and Si–Si bond lengths maintain distinctly different lengths and vary in a linear fashion as a function of alloy composition across the entire composition range 0 < x < 1, in good agreement with expectations derived from the ab-inito electronic structure calculations. The results indicate that SiGe is a typical disorder material and that the bond lengths and bond angles are distorted with alloy composition in SiGe.
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More From: Journal of Materials Science: Materials in Electronics
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