Atomic-scale characterization of single and double layers of InAs and InAlAs Stranski-Krastanov quantum dots

Abstract

We report a detailed structural characterization of single and double layers of InAs and InAlAs quantum dots (QDs) and their wetting layers (WLs) by atomic force microscopy (AFM) and cross-sectional scanning tunneling microscopy (X-STM). The X-STM analysis with atomic resolution showed that the InAlAs WL consists of two distinct layers: a bottom part where all the Al atoms of the InAlAs alloy settled, and a top part containing exclusively In and Ga atoms. The QDs formed from the InAlAs layer contains no Al atoms at all and lie on top of the Al-rich WL. In the double layers of QDs, the InAlAs QDs were used as a seed to influence the nucleation of the InAs QDs grown on top. A gradual decrease in the density of the top InAs QDs was observed in the AFM images with increasing thickness of the GaAs spacer. The X-STM images showed that both QDs layers were completely intermixed for a 2-nm-thick spacer, while effective strain-induced stacking of both types of QDs was observed for a GaAs spacer thickness of 4 nm. However, both QD layers were completely decoupled for a GaAs spacer thickness of 8 nm and could thus be treated as individual layers.