Atomic layer deposition of tin oxide nanofilms using tetraethyltin

Abstract

Due to variety of applications of tin oxide thin films such as solid state gas sensors, solar cells, transparent conductive oxide coatings, catalysts, and anodes for Li-ion batteries, it is desirable to develop convenient and high effective technique of atomic layer deposition for this material. In this paper we consider in details the prospects of using tetraethyltin to produce thin films of tin dioxide by atomic layer deposition. Water, hydrogen peroxide, oxygen, ozone and oxygen plasma were used as co-reactants for SnOx deposition. It was found that the type of co-reactant has a huge impact on the growth rate, composition and morphology of the films. Features of synthesis and prospects for use the films in lithium-ion batteries are considered.