Abstract
Atomic layer deposition (ALD) and molecular layer deposition (MLD) are vapor phase deposition techniques used to create conformal coatings with molecular‐level control of thickness and composition. Recently, ALD and MLD have been extensively exploited to engineer the complex interfaces of dye‐sensitized solar cells (DSSCs) and other molecularly functionalized photoelectrochemical devices to improve the performance and long‐term stability. This progress report describes the recent advances in the applications of ALD and MLD for sensitized solar cells including DSSCs then discusses current challenges and future opportunities of ALD.
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