Atomic force microscopy of steep side-walled feature with carbon nanotube tip

Abstract

The characteristics of the carbon nanotube AFM tip was investigated as it is used to measure the critical dimensions in the high aspect ratio structures. The research has been done to demonstrate the limitations of the CNT probe in imaging steep or vertical sidewall. Two kinds of samples, silicon dot and the lines in the ArF resist pattern were profiled by using carbon nanotube tip in the tapping mode AFM. There is a large oscillation at the steep sidewall, which cannot be controlled by merely changing scan variables, except by slowing down the scan up to the impractical level. The interaction between the long, slim CNT probe and the vertical sidewall severely limits the usefulness of AFM as a CD metrology tool. To achieve hi-resolution and high aspect ratio imaging simultaneously, a stiffer and/or modifed probe under clever non-contact 2D feedback is needed.