Abstract
Nanoscale science and technology is today mainly focused on the fabrication of nanodevices. Ourapproach makes use of lithography processes to build the desired nanostructures directly. Thefabrication process involves an electron-beam lithography technique to define metallicmicrostructuresonto which nanometre scale patterning is performed using an atomic force microscope (AFM) as amechanical modification tool. Both direct material removal and AFM-assisted mask patterning areapplied in order to achieve the smallest possible separation between electrode pairs. The samplepreparation involves a polymer deposition process that results in conformal growth and in surfaceroughness comparable to that of the substrate. The results of the application of this technique showthat the process is reproducible and exhibits a good operation control during the lithographic steps,both ensured by the imaging facilities of the AFM. The nanolithography technique has been used tofabricate nanogap electrodes to be used for molecular devices. The study reported here can beconsidered as a reliable starting point for the development of more complex nanodevices, such assingle-electron transistors.
Published Version
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