Abstract
Nano-devices have many potential applications. However, how to connect the nano-components is a problem during fabrication of nano-devices. This paper introduces a nano-line deposition method with atomic force microscope(AFM). This method is expected to be used as a nano-welding technique, which can improve the physical and electrical connections between the various components of nano-devices. With this method, nano-lines can be deposited continuously, rather than depositing a row of nano-dots to form a nano-line. The method comprises two features. One is current-induced deposition rather than voltage. Experiments show that current-induced method can fabricate more continuous and smoother nano-lines than voltage-induced method.The other is a simple tip-substrate distance control means. AFM deposition is based on field emission theory, so tip-substrate distance is an important factor for field emission. A simple tip-substrate distance control means is introduced in this paper, which makes the deposition process easier.
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