Arrays of Quasi-One-Dimensional GaAs Nanocrystals Grown on the Oxidized Surface of the Si/GaAs(001) Heterostructure: Effect of the Si Epitaxial Layer on the Array Structure

Abstract

Structures with arrays of planar and tilted quasi-one-dimensional GaAs nanocrystals have been grown on GaAs(001) substrates. An epitaxial silicon layer oxidized in air was used as a passivation coating. The amount of silicon deposited varied from structure to structure and was equivalent to 1, 2, 4, and 6 atomic layers. It has been found that in the case of a passivation layer based on silicon with a thickness of 1 atomic layer, an array of planar nanocrystals is formed, and in other cases, inclined quasi-one-dimensional nanocrystals. Nanocrystals are surrounded by crystallites, the shape, size, orientation, and distribution density of which change with the amount of silicon. The lowest density of crystallites was achieved with a silicon layer 6 atomic layers thick. Keywords: molecular-beam epitaxial, GaAs, Si, quasi-one-dimensional nanocrystals, vapour-liquid-crystal.