Abstract
Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H<sub>2</sub>O as a Reactant
Published Version
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https://doi.org/10.1021/acs.chemmater.0c04496
Journal: Chemistry of Materials | Publication Date: Jun 11, 2021 |
Citations: 20 |
Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H<sub>2</sub>O as a Reactant
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