Abstract
This paper reports results of experimental investigations on composition variations in Ni-Fe films formed by ion beam sputtering. The composition variations, depending on both substrate angle and temperature, are caused by high energy Ar+ ions. The Ni fraction in Ni-Fe film and its deposition rate decrease as the ion current increases; this is because of preferential resputtering. Conversely, the Ni fraction increases as the substrate temperature increases without deposition rate change under Ar+ ion bombardment; this has not previously been reported.
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