Abstract
The molecular orientation of nematic 5CB on various solid substrates eroded obliquely by an Ar + ion-beam has been studied experimentally. The sputtering on an isotropic substrate (normally evaporated SiO) results in a nematic planar orientation along the projection of the local velocity of the ion direction on the surface. When using an anisotropic substrate (obliquely evaporated SiO which gives planar orientation in absence of sputtering) we find a continuous twist of the resulting alignment, from the initial planar orientation towards the beam track projection. Although the geometry allows it, we do not observe any surface orientation bistability
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