Approach to Formation of Ultra-Pure Metal Films by Means of Ion Beam Technology

Abstract

In order to obtain very pure metal films, ion beam technology is a most sophisticated method. Theoretically, it offers more pure materials than other methods. The combination of a mass-analyzing process and an ultra-high vacuum environment will achieve it. However, in practice it is not so easy to put together such a process, because gaseous impurities will be generated at a conventional ion source where a plasma discharge usually exists. In order to produce ultra-pure metal films, we have proposed three ion beam technologies, namely, ‘self sputtering deposition’. ‘droplet-free vacuum arc source’ and ‘direct ion beam deposition’.