Abstract
Highly transparent conductive ITO coatings with transparency ≥80% and resistivity ∼2.8 × 10−4 Ωcm are prepared directly by substrate heating using an advanced 3D confined high-density magnetron source (3DMS). The deposited ITO films exhibit excellent carrier concentration, mobility, and crystallinity at a moderate substrate temperature and without post-annealing. Data reveals that the combination of very high-density plasma at a low electron temperature and moderate substrate heating is favorable for developing ITO materials for transparent electrode applications. The electrical, optical, structural, and morphological properties of the deposited films are investigated in details in light of the plasma chemistry and substrate heating.
Published Version
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