Abstract
Application of STEM EELS Quantification Relative Compositional Ratio Mapping to Characterize SiCOH - Ultra Low-k Dielectric Materials in Si-based Devices
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
Paper Title
Journal
Date
