Abstract
In this work, an investigation for inserting a SiGe layer in an insulated-gate bipolar transistor (IGBT) has been performed to analyze the relation between on-state property and breakdown voltage (BV) with the help of technology computer-aided design simulation. For a carrier storage (CS) IGBT, which is widely studied for enhancing conductivity modulation by increasing hole density, the BV decreases by increased conductivity in the CS layer. However, by using the SiGe layer instead of the CS layer, the on-state property is improved with lower BV reduction than a CS IGBT due to the absence of impurity doping. Finally, an optimization for a Ge mole fraction is performed. Based on the results, it is found that the SiGe with 0.3 mole fraction shows the best performance because over 0.3 Ge mole fraction, the excessive energy band bending induced by over-accumulated holes makes low carrier velocity in the n-drift layer.
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