Abstract
High dose ion implantation or irradiation of metals may lead to amorphization depending on the ion-target system under consideration. Some advantages of the application of ion beam techniques in amorphization studies are outlined. The experimental techniques used in thin film amorphization studies like film preparation, ion bombardment, backscattering and thin film X-ray diffraction analysis are described. Examples of amorphization studies are given for irradiation of elements (Ga) and compounds (Nb 3 Ir) and binary alloys produced by successive implantation (B and P in Nb, B in Mo). The continuous observation of the amorphization process by implantation allows a direct comparison with theoretical amorphization models. The examples show that strain accumulation appears as an important prerequisite for the transition into the amorphous state.
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