Abstract
Factor analysis is applied to the Auger crater-edge profile of a palladium/hydrogenated amorphous silicon layered structure. The results show, apart of a considerable improvement in interface determination, new information not obtainable by the conventional Auger depth profiling technique, which makes this procedure extremely useful for thin film depth profiling.
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Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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