APPLICATION OF EQUIPMENT FOR AUTOMATIC CONTROL OF PLANAR STRUCTURES IN MANUFACTURING MASTER MASKS OF INTEGRATED CIRCUITS ON PHOTO-MASKS

Advanced optical proximity correction (OPC) designs have resulted in many challenges for both the manufacturers of photomasks and automated defect inspection equipment. The successful manufacture of advanced OPC photomasks includes the ability to resolve the OPC features, complete an automated defect inspection that captures all of the defects of concern, and accurately recognize and disposition these defects. New defect types associated with OPC features are important and will print on a wafer or affect critical feature dimensions. Advances in defect detection on designs with OPC required breakthroughs by both the photomask and inspection system manufacturer. Process improvements focused on better resolving OPC features, along with advancements in automated defect inspection systems, have resulted in overall improvements in automated defect infection capability for OPC designs. The ability of OPC inspection algorithms to detect critical defects was confirmed with the DuPont VerithoroTM 890, the OPC3 programed defect test reticle, and defect capture occurrences on actual designs with advanced OPC features. Sensitivity improvements of up to 0.17 micrometer were demonstrated for both OPC and non-OPC type defects.

The paper presents an integrated solution of a problem to develop a set of the equipment for the defect-free production of reticles and photomasks. The integrated approach to the equipment design allows to obtain certain advantages disclosed below. Accordingly, the paper highlights the following main issues: *Practical realization of these advantages in the special process equipment developed by the KBTEM-OMO enterprise of the PLANAR. *Advantages in the development of a complete set of the special process equipment; Without taking into account technical and chemical processes, this complete set includes three component parts: *Multi-beam laser pattern generator; *Die-to-Database reticle inspection system; *Laser reticle repair system.

Specifications for advanced photomask are becoming more and more stringent as the industry shifts to smaller lithography nodes. Among various requirements for photomasks, the need for stringent mean to target (MTT) control of critical dimensions (CDs) as well as the reduction of defects is the hottest issue for current photomask manufacturers. In this paper a unique photomask manufacturing method for precise CD-MTT control is described and an approach to defect free manufacturing (DFM) is also proposed. In the new method, a two-step compensation to cancel CD errors is adopted. Its essence is the selection of metrology tools used in each step. An MTT of +/- 5nm is achieved using this method. For DFM, a cluster tool, combining the processing tools with each other by a robot handler, has been installed and avoiding human handling is proved to be a correct way.

Using of complex equipment SemiTEq shown in example of a closed cycle of basic technological operations for production of high-power field microwave transistors based on gallium nitride in the Svetlana-Rost JSC. Basic technological operations are shown: MBE growth of heterostructures, metal deposition of contacts using electron-beam evaporation system, thermal annealing of ohmic contacts, meza-isolation plasma-chemical etching and dielectric plasma deposition. The main problems during the technological route as well as ways to solve are discussed. In particular, ways to reduce the dislocation density in the active region of the transistor heterostructures grown on the mismatched substrates are described in detail. Special attention given to the homogeneity and reproducibility both after some manufacturing operations and applied to the end product.

The paper presents an integrated solution of a problem to develop a set of the equipment for the defect-free production of reticles and photomasks. The integrated approach to the equipment design allows to obtain certain advantages disclosed below. Accordingly, the paper highlights the following main issues: practical realization of these advantages in the special process equipment developed by the KBTEM-OMO enterprise; advantages in the development of a complete set of the special process equipment. Without taking into account technical and chemical processes, this complete set includes three component parts: Multi-beam laser pattern generator; Die-to- Database reticle inspection system; Laser reticle repair system. Ill. 1, tabl. 6, bibl. 3 (in English; summaries in English, Russian and Lithuanian).

The recently installed Sigma7100 laser pattern generator brings a new concept into photomask manufacturing. The spatial light modulator (SLM) technology enables 2D patterning using commercially available 248 nm lasers. This wavelength shift from the 413 nm wavelength of the Omega6000 scanning laser pattern generators facilitates the high resolution needed for 100 nm mask production. In addition, the partially coherence of the 2D patterning further enhances CD linearity and edge acuity. The rapidly increasing mask costs are partially attributed to increasing photomask writing times. These tend to increase as feature density increases with the roadmap, which is a challenge for any pattern generator with a limited number of writing beams. Instead, the SLM technology relies on the massive parallelism of one million micromirrors in combination with gray-scale control for fine addressing. A real-time FPGA-based data-rendering engine matches the speed. The result is pattern generation with high resolution at manageable mask writing times

Laser pattern generators ALTA 3500 and 3700 are widely used for 0.18 micron and above technology nodes in photomask manufacturing. They have low butting, high throughput and high position accuracy, with some weaknesses such as, corner rounding, no proximity effect correction and poor CD linearity when compared to E-beam pattern generators. Optical Proximity Correction (OPC) software was thus created to extend the productivity of laser pattern generators. For contact holes serifs are typically added at the four corners to enhance pattern fidelity. However, the serifs or scattering bars can significantly increase the data size. In our study, we generated serifs for contact holes but applied different exposure strategies: (1) lumping serifs together with the main pattern; (2) exposing serifs and main pattern separately with same dosage; (3) exposing serifs and main pattern separately with different dosages. We examined the results of each approach in terms of contact hole quality, throughput, and inspection results.

Purpose. Elements of the equipment set will be created using the method of cassetteless breeding of grain moth for the industrial production of trichogram. This method involves carrying out a cycle of technological operations (infection, maintenance, exit and collection of imago) in one device, which allows to reduce the number of technological operations, labor costs, and dust generation. Thus, the cultivation of grain moth in a large volume makes it possible to abandon the traditional cassette-box technology and move to the construction of entomological production of a new generation. Methods. Research will be conducted using methodological approaches that are used in international practice, in particular, to meet the requirements of ISO 17025. The calculation of the mass balance and the technological scheme of trichogram production on the basis of cassetteless breeding of grain moth should ensure the reduction of operational costs for the implementation of technological processes of obtaining trichogram with guaranteed biological quality. Constructive decisions that will be made when creating a research and industrial model must be based on the principles of unification and resource conservation and meet sanitary, hygienic and environmental requirements. The production of elements of a set of equipment should be based on the use of materials and technologies that would ensure reliability, durability, reasonable cost of products. Results. Design documentation has been developed for a set of industrial equipment for the production of trichogram, which is characterized by the use of the method of growing grain moth in a large volume and the principle of optimizing technobiocenosis parameters in accordance with the biological and ecological needs of the “host” of the trichogram. Scientific and practical recommendations on the organization of trichogram production for biolaboratories have been formed. Samples of elements of the set of industrial equipment were produced and an approval certificate was drawn up. Tests of trichogram production equipment were carried out. The elements of the set of industrial equipment have been refined. Conclusions. The developed technological scheme and the calculation of the mass balance of the industrial production of trichogram based on cassetteless breeding of grain moth will provide an opportunity to increase the productivity of biolaboratories by 10–15 %, while obtaining a trichogram of guaranteed biological quality. An increase in the number of automated and mechanized technological operations is ensured by up to 20 %, a decrease in the metal content of the created grain moth and trichogram breeding equipment by up to 15 % compared to the existing one. Keywords: grain moth, trichogram, cassetteless breeding method, technological scheme, biolaboratories.

Purpose: This study aims to evaluate how the integration of Business Process Reengineering (BPR) and Risk-Based Costing (RBC) can improve both operational and resource efficiency in manufacturing. The research focuses on the General Company for Automotive and Equipment Manufacturing – Battery Factory, specifically on the 90 Ampere dry battery production process in 2024. Research methodology: The study adopts a mixed-method approach combining quantitative and descriptive analyses in an applied research design. The BPR method was used to identify inefficiencies and process waste within the main production line, while the RBC approach was employed to map and quantify risks influencing product cost in key manufacturing operations. Results: Findings revealed that the joint application of BPR and RBC significantly reduced production cycle times, material waste, and operational costs. The integrated approach also improved risk-adjusted resource allocation, demonstrating superior performance compared to implementing either method independently. Conclusions: The combination of BPR and RBC enhances efficiency, cost control, and risk management in manufacturing operations. The study recommends the adoption of this integrated approach across the company’s product lines and the enhancement of accounting and management information systems to ensure sustainability. Limitations: The research is limited to one factory and a single product type, which may restrict generalizability to other industries or products. Contribution: This study contributes to the development of integrated efficiency frameworks in industrial management, highlighting the synergistic potential of BPR and RBC in optimizing production and resource utilization.

As the design rule of lithography becomes smaller, printability of reticle defect to wafer is critical for the photomask manufacturing technology. In order to improve the controllability of reticle defects, inspection and repair systems are expanding their capability by continuously modifying hardware and software. This is a good solution to detect and review the defect but it is indirect approaching to reduce the defect in the photomask process. To produce the photomask of defect free or low defect density, effort is needed to improve the capability of defect control in the mask-making process and to evaluate the source of hard defect as well as soft defect. In this paper, we concern the defect source and the feature of printed defects in photomask manufacturing steps. We also discuss the efforts to eliminate the defect source and to control the mask-making process with low defect density. In order to eliminate the source of defects, we partition the mask-making process with defect inspection system, SLF27 TeraStar and Lasertec MD2000, and review a defect shape with CD SEM and AFM. And we compare printed defects, which exist in each process steps, after dry etching process.

Companies devoted to manufacture operations of small sets for the automotive industry need to follow the usual quality standards, accomplishing with the delivery times. Commonly, these operations are performed with automatic or semi-automatic equipment in order to increase their competitiveness. Some partially automated systems allow complex manufacturing operations but cannot always ensure the required level of quality. This work was developed in order to solve quality problems reported on the transmission system of automotive windshield wipers, where a brass’s tube is inserted and partially deformed at one of the tips. However, tubes’ suppliers cannot ensure the dimensional accuracy needed by the semi-automatic system, and the manufacturing equipment is not able to detect and reject these components before the assembling process, resulting in the production of defective sets. In order to overcome this problem, impossible to solve using the current semi-automatic equipment, a new solution was developed through a fully automated system under controlled costs, enabling the set manufacturing operation in a competitive way.

The article analyses the experimental results of the cage area effect on green lacewing productivity. The tests were made under the conditions of the complete green lacewing (Chrysoperla carnea) rearing process on the base of the Engineering and Technological Institute “Biotekhnika” of NAAS of Ukraine in partnership with the the Latvia University of Life Sciences and Technologies. The research was focused on the correlation between the larvae cage productivity and its inner area. Four cage types with the same design and different areas were studied in the experiments. The set of experiments includes parallel insect rearing in three cages of each type. The specific productivity in cocoons·cm-2 was chosen as the main cage efficiency parameter. The analyses showed the productivity reduction with the cage area increasing. However, in the range of the cage area of 550-950 cm2 the average productivity kept constant of 0.64 cocoons·cm-2. The detected interval could be used for cage manufacturing and further equipment set forming with increased economic efficiency. The cage number in such equipment set would be 1.5 times less in comparison to the basic one for the same set productivity. Therefore, the equipment set manufacturing and maintenance costs would be decreased.

This paper presents a method for simulating basic manufacturing operations (unload, load, process, move, and store) in a 3D virtual environment. The virtual environment provides a framework for representing a facility layout in 3D, which encapsulates the static and the dynamic behavior of the manufacturing system. The 3D manufacturing objects in the facility are mapped with the nodes in the framework. The framework, a modified scenegraph structure, is a tree structure, which can be manipulated by updating the parent-child relationships and the transformation matrix to simulate the basic manufacturing operations. The method can be easily extended to represent more specific manufacturing operations.

This paper presents a method for simulating basic manufacturing operations (unload, load, process, move, and store) in a 3D virtual environment. The virtual environment provides a framework for representing a facility layout in 3D, which encapsulates the static and the dynamic behavior of the manufacturing system. The 3D manufacturing objects in the facility are mapped with the nodes in the framework. The framework, a modified scenegraph structure, is a tree structure, which can be manipulated by updating the parent-child relationships and the transformation matrix to simulate the basic manufacturing operations. The method can be easily extended to represent more specific manufacturing operations.

The processes and equipment for manufacturing, assembly, and control operations, adapted to the needs of modern industry, shall be determined according to the volume of production and the technical conditions imposed, at a level which ensures economic effects on the recovery of costs for their design and execution. The design-optimization algorithm, with the four working steps, applied on the case study presented, allows the determination of the optimal number and succession of technological processes, but also of new processing methods, based on a technological graph and optimization criteria. In the second step, determine for each technological operation the optimal orientation and fixation scheme of the analyzed part, combining elements of the set theory and the global utility method, with a method of simultaneous optimization of the orientation and fixation fundamentals for two different transformation areas with distinct quotas and conditions that need to be achieved. In the third step, is identified and analyzed several construction variants of structures for the equipment. By formulating a technologically adapted graph to describe structures of orientations, but also other structures, is obtained an associated mathematical model and optimization criteria for the optimum design variant of the orientation and fixation at the analyzed operation. When is desired a complete appreciation of all the technological operations, the fourth step of system optimization is proposed, which is also based on a technology graph and an associated mathematical model adapted to the evaluation of the analyzed types of equipment.