Abstract

Application of Chlorella vulgaris for polishing secondary effluent of a wastewater treatment (containing C, N and P) was investigated. As a first step, batch experiments were conducted in Bold's Basal Media (BBM) to quantify the effects of orthophosphates (0.1-107mg/L), organic carbon (0-500mg/L as acetate) and N/P ratio on the growth of Chlorella vulgaris. The results revealed that the orthophosphate concentration was found to control the removal rates of nitrates and phosphates; however, both were effectively removed (> 90%) when the initial orthophosphate concentration was 4-12mg/L. The maximum nitrate and orthophosphate removals were observed at an N:P ratio of ~ 11. However, the specific growth rate (µ) was significantly increased (from 0.226 to 0.336g/g/day) when the initial orthophosphate concentration was 0.1-4.3mg/L. On the other hand, the presence of acetate had significantly improved the specific growth and specific nitrate removal rates of Chlorella vulgaris. The specific growth rate increased from 0.34g/g/day in a purely autotrophic culture to 0.70g/g/day in the presence of acetate. Subsequently, the Chlorella vulgaris (grown in BBM) was acclimated and grown in the membrane bioreactor (MBR)-treated real-time secondary effluent. Under the optimised conditions, 92% nitrate and 98% phosphate removals (with a growth rate of 0.192g/g/day) were observed in the bio-park MBR effluent. Overall, the results indicate that coupling Chlorella vulgaris as a polishing treatment in existing wastewater treatment units could be beneficial for highest level of water reuse and energy recovery goals.

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