Application of atmospheric solution precursor plasma spray to photocatalytic devices for small and medium industries in developing countries

Abstract

For development of a functional film deposition process with high deposition rate, as a basic study, TiO2 films were deposited by atmospheric solution precursor plasma spray (ASPPS) process. Ethanol-diluted titanium tetraisobutoxide [TTIB: Ti(OC4H9)4] was used as a feedstock. To achieve a high plasma thermal energy at a low discharge power, N2-dominant Ar/N2 as the plasma working gas was used, for film deposition at various deposition distances. Consequently, photocatalytic TiO2 with a rutile/anatase mixture film structure was deposited evenly in this case. By conducting methylene blue decomposition and wettability tests, photocatalytic properties of the film were confirmed. When a TiO2 film was applied to photocatalytic dye-sensitized solar cells (DSSCs), the cells generated an electromotive force of 0.143Voc, which is close to those of commercial DSSCs. From these results, the ASPPS process was found to have high potential for high rate functional film deposition and was cost effective, making it suitable for developing countries.