Abstract
Some extremely reactive metals like Ce, U, and Pu are easily oxidized; instead of forming a stable surface oxide layer preventing further oxidation, the oxide layer break into powders as exposed to air in few days. For nuclear mineral industry, these materials need to be in storage for 1 month or so, which need to minimize surface oxidation. To provide a novel way to storage, atomic layer deposition (ALD) of thin Al2O3 film on the Ce metal surface is demonstrated, which prevents the oxidation of Ce for 40 days with just 2 nm of Al2O3. ALD also minimizes the foreign elements of passivation materials with great uniformity for different shapes, which unveils the potential for extremely reactive metal passivation in nuclear industry.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
